发明名称 |
Optical path length tuning methods in etalons |
摘要 |
Fine-tuning of the optical path length in etalon cavities is achieved by slight variations of the cavity's index of refraction. Such index of refraction variations are accomplished by varying the relative gas mixture in gas-gap etalons or UV-exposing doped glass layer(s) in solid etalons or gas-gap+glass etalons.
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申请公布号 |
US6721079(B2) |
申请公布日期 |
2004.04.13 |
申请号 |
US20020215054 |
申请日期 |
2002.08.08 |
申请人 |
ACCUMUX TECHNOLOGIES, INC. |
发明人 |
YEH POCHI ALBERT;CAMPBELL SCOTT PATRICK |
分类号 |
G02B1/06;G02B5/28;(IPC1-7):G02F1/03;G02B27/00 |
主分类号 |
G02B1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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