发明名称 Optical path length tuning methods in etalons
摘要 Fine-tuning of the optical path length in etalon cavities is achieved by slight variations of the cavity's index of refraction. Such index of refraction variations are accomplished by varying the relative gas mixture in gas-gap etalons or UV-exposing doped glass layer(s) in solid etalons or gas-gap+glass etalons.
申请公布号 US6721079(B2) 申请公布日期 2004.04.13
申请号 US20020215054 申请日期 2002.08.08
申请人 ACCUMUX TECHNOLOGIES, INC. 发明人 YEH POCHI ALBERT;CAMPBELL SCOTT PATRICK
分类号 G02B1/06;G02B5/28;(IPC1-7):G02F1/03;G02B27/00 主分类号 G02B1/06
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