| 摘要 |
A semiconductor device having an align key, which is simultaneously formed by implanting ions before defining an active region, for a precise alignment with a preformed well on a semiconductor substrate when forming a photoresist pattern for defining the active region, and a method for manufacturing the same are provided The semiconductor device includes the align key formed of a first recess having a first depth from a surface of a semiconductor substrate in a scribe line region of the semiconductor substrate, and a second step portion formed by a second recess having a second depth, which is less than or equal to the first depth, from the surface of the semiconductor substrate in a well region of the semiconductor substrate.
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