Exposure apparatus and exposure method

摘要

A photolithography exposure apparatus exposes a substrate to a pattern image formed on a mask to transfer the pattern onto the substrate. The apparatus includes a substrate stage on which the substrate is mounted. The substrate stage together with the substrate is movable when the substrate is being exposed to the pattern image. A memory stores pattern image distortion information generated in accordance with an exposure position on the substrate when the pattern image is being transferred onto the substrate. A compensator compensates for the distortion so that the pattern is formed cleanly on the substrate.