发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 A photosensitive composition comprising, (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200'000 or less; (B) at least one photoinitiator compound of formula I wherein R<SUB>1 </SUB>is linear or branched C<SUB>1</SUB>-C<SUB>12</SUB>alkyl; R<SUB>2 </SUB>is linear or branched C<SUB>1</SUB>-C<SUB>4</SUB>alkyl; R<SUB>3 </SUB>and R<SUB>4 </SUB>independently of one another are linear or branched C<SUB>1</SUB>-C<SUB>8</SUB>alkyl; and (C) a monomeric, oligomeric or polymeric compound having at least one olefinic double bond, is especially suitable for preparting photoresists, in particular color filters.
申请公布号 KR20040030848(A) 申请公布日期 2004.04.09
申请号 KR20047001011 申请日期 2002.07.18
申请人 发明人
分类号 G03F7/031;C08F2/50;G02B5/20;G03F7/00;G03F7/004;H01L21/027;H01L51/50;H05B33/10 主分类号 G03F7/031
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