LITHOGRAPHY PROJECTION DEVICE AND MEASURING SYSTEM TO ALLOW RADIATION TO CHARGE ENTIRE PUPIL OF PROJECTION LENS AND TO MINIMIZE EFFECT OF WAVE FRONT ABERRATIONS

摘要

PURPOSE: A lithography projection device and a measuring system are provided, to allow radiation to charge the entire pupil of a projection lens and to minimize the effect of wave front aberrations. CONSTITUTION: The lithography projection device comprises a radiation system which supplies a projected beam of radiation; a support structure which supports a patterning means patterning the projected beam according to a certain pattern; a substrate table which holds a substrate; a projection system which projects the beam patterned on the target area of a substrate; and a measuring system, wherein the measuring system comprises a structure increasing the pupil charge of radiation and a diffraction unit which can move into the projected beam between the radiation system and the projection system; and a sensor module which senses the radiation crosses the projection system measuring the wave front aberrations of a projection system.