发明名称 CHEMICAL CONVERSION SYSTEM, CHEMICAL CONVERSION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR WAFER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the variation of layers formed on wafers through chemical conversion among the wafers. SOLUTION: The chemical conversion system 100 in an ideal embodiment of this invention is provided with a computer 101 which decides the condition for performing chemical conversion on a silicon wafer 11 based on the physical property of the wafer 11 and a single wafer chemical conversion treating device 105 which performs chemical conversion treatment on the wafer 11 in accordance with the conditions decided by means of the computer 101. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004111492(A) 申请公布日期 2004.04.08
申请号 JP20020269243 申请日期 2002.09.13
申请人 CANON INC 发明人 TSUBOI TAKASHI;YANAGIDA KAZUTAKA;SAKAGUCHI KIYOBUMI
分类号 H01L21/3063;H01L21/02;H01L27/12;(IPC1-7):H01L21/306 主分类号 H01L21/3063
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