发明名称 |
CHEMICAL CONVERSION SYSTEM, CHEMICAL CONVERSION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR WAFER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To reduce the variation of layers formed on wafers through chemical conversion among the wafers. SOLUTION: The chemical conversion system 100 in an ideal embodiment of this invention is provided with a computer 101 which decides the condition for performing chemical conversion on a silicon wafer 11 based on the physical property of the wafer 11 and a single wafer chemical conversion treating device 105 which performs chemical conversion treatment on the wafer 11 in accordance with the conditions decided by means of the computer 101. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004111492(A) |
申请公布日期 |
2004.04.08 |
申请号 |
JP20020269243 |
申请日期 |
2002.09.13 |
申请人 |
CANON INC |
发明人 |
TSUBOI TAKASHI;YANAGIDA KAZUTAKA;SAKAGUCHI KIYOBUMI |
分类号 |
H01L21/3063;H01L21/02;H01L27/12;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3063 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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