发明名称 PHOTOCHEMICAL VAPOR DEPOSITION SYSTEM AND METHOD
摘要 PROBLEM TO BE SOLVED: To realize neighboring field photo CVD (Chemical vapor Deposition) in which the wavelength conditions of light supplied from a light source is relaxed. SOLUTION: In the photochemical vapor deposition system, neighboring field light is applied, so that a gas present in the vicinity of a substrate is composed, and is deposited on the substrate. In this case, light having a wavelength equal to or above that of light equivalent to the dissociation energy of the gas is outputted via an acute part obtained by making optical fiber acute to generate neighboring field light. The gas is dissociated through a multistage transition stage to obtain a decomposed product, and the decomposed product is deposited on the substrate. Thus, the wavelength conditions of the light supplied from the light source can be relaxed. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004107744(A) 申请公布日期 2004.04.08
申请号 JP20020273539 申请日期 2002.09.19
申请人 JAPAN SCIENCE & TECHNOLOGY CORP 发明人 KAWAZOE TADASHI;OTSU GENICHI
分类号 C23C16/48;H01L21/205;(IPC1-7):C23C16/48 主分类号 C23C16/48
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