| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color photosensitive resin composition having high sensitivity which can be prepared in a short time even when the composition contains a coloring material with high concentration, and to provide a high-quality color filter excellent in surface smoothness, pattern profile and lightness by using the above composition. <P>SOLUTION: The color photosensitive resin composition contains: (A) a binder resin; (B) photopolymerizable monomers; (C) a photopolymerization initiator; (D) a coloring material; and (E) a solvent. The composition contains at least a biimidazole compound as the photopolymerization initiator (C) and contains at least one kind of aliphatic cyclic ketone-based solvent selected from a group consisting of cyclopentanone and cyclohexanone, and propyleneglycol monoalkylether acetate as (E) the solvent. The powder X-ray diffraction pattern of the biimidazole compound shows a diffraction peak in each region of at least from 9.7° to 9.9° and from 10.0° to 10.2° of 2θ angle by Cu-Kα characteristic X-ray diffraction. <P>COPYRIGHT: (C)2004,JPO |
