发明名称 Material for shadow mask, method for production thereof, shadow mask comprising the material and picture tube using the shadow mask
摘要 A material for a shadow mask, characterized in that it has a chemical composition: C=0.0030 wt %, Si=0.03 wt %, Mn: 0.1 to 0.5 wt %, P=0.02 wt %, S=0.02 wt %, Al: 0.01 to 0.07 wt %, N=0.0030 wt %, B: an amount satisfying 0.5<=B/N<=2, and balance: Fe and inevitable impurities, and can form a shadow mask having a coercive force Hc of 90 A/m or less; and a method for producing the material, characterized in that use is made of a raw material having the above chemical composition, the finishing temperature in hot rolling is lower than Ar3 point by O to 30° C., the coiling temperature is 650 to 700° C., and the rolling reduction percentage in the final rolling (secondary cold rolling) is 30 to 45%. The material produced by the method exhibits magnetic characteristics being uniform in a coil and excellent as described above.
申请公布号 US2004066129(A1) 申请公布日期 2004.04.08
申请号 US20030432379 申请日期 2003.10.08
申请人 UEDA TOSHIYUKI;YABUTA NAOMI;AOKI SHINICHI 发明人 UEDA TOSHIYUKI;YABUTA NAOMI;AOKI SHINICHI
分类号 C21D9/46;C21D8/02;C22C38/00;C22C38/02;C22C38/04;C22C38/06;H01J9/14;H01J29/07;(IPC1-7):H01J29/80;C22C38/08 主分类号 C21D9/46
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