发明名称 Heterojunction bipolar transistor having wide bandgap material in collector
摘要 The safe operating area (SOA) in a heterojunction bipolar transistor is improved by inserting a material between the collector and subcollector of the transistor with the insertion layer being a material having a wider energy bandgap than the material of the collector. The insertion layer increases the breakdown field at the collector-subcollector junction and thereby increases the Kirk effect induced breakdown voltage.
申请公布号 US2004065898(A1) 申请公布日期 2004.04.08
申请号 US20020267342 申请日期 2002.10.08
申请人 EIC CORPORATION 发明人 CHAU HIN FAI;DUNNROWICZ CLARENCE JOHN;CHEN YAN;LEE CHIEN PING
分类号 H01L29/08;H01L29/737;H01L31/0328;(IPC1-7):H01L31/032 主分类号 H01L29/08
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