| 摘要 |
PURPOSE: A photography system is provided to interrupt a photolithography system according to a delaying state of an exposure post-process part by installing an interlock part at an exposure post process part formed between an exposure part and a development part. CONSTITUTION: A photography system includes a coating part(120), an exposure part(140), a development part(160), an exposure post-process part(150), and an interlock part(159). The coating part(120) performs the process for coating a photoresist layer on a wafer. The exposure part(140) performs the process for transcribing a shape of a mask on the photoresist layer. The development part(160) performs a process for removing selectively the exposed photoresist layer. The exposure post-process part(150) is formed between the exposure part and the development part. The interlock part(159) interrupts a photolithography process when the exposure post-process part delays a wafer loading process during a predetermined period of time.
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