METHOD FOR DEPOSITING THIN FILM FOR TERAHERTZ BAND OPTICAL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for depositing a thin film for a terahertz band optical element by which the thin film for a terahertz band optical element is easily manufactured and matching of refractive indexes is possible without degrading the performance of a semiconductor detector. SOLUTION: The optical element of light from 100 GHz to 10 THz is inputted to a plasma CVD device, gaseous starting material for CVD is successively switched and a plurality of laminated films including a film having a large refractive index and a film having a refractive index smaller than that are successively deposited on the surface to obtain an optical wave interference film. COPYRIGHT: (C)2004,JPO