发明名称 CARBON FILM COATING PROCESS AND APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To deposit a carbon film on a vessel through plasma coating without disturbing the structure of the carbon film. <P>SOLUTION: A vessel (C) formed in a blow molding apparatus (10) is conveyed by a conveyor (100) to a carbon dioxide-injecting apparatus (20). Among several nozzles (23) established on a lower surface of a rotating drum (21), the carbon dioxide-injecting apparatus opens a nozzle located at a predetermined position and ejects carbon dioxide from it to fill carbon dioxide into the vessel passing beneath the opened nozzle 23. The vessel filled with carbon dioxide is conveyed by the conveyor to a plasma coating apparatus (30) and subjected to a carbon film plasma coating. Since the vessel contains no air when the plasma coating is started, the structure of the carbon film is not disturbed by reaction of nitrogen and oxygen atoms during plasma coating. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004107781(A) 申请公布日期 2004.04.08
申请号 JP20020275683 申请日期 2002.09.20
申请人 MITSUBISHI HEAVY IND LTD 发明人 NORIMATSU YASUFUMI;NAKACHI MASAAKI
分类号 B65D1/00;B05D3/10;B05D7/22;B29C49/42;B29C49/58;B29L22/00;B65D1/09;B65D23/02;C23C16/26;C23C16/455;(IPC1-7):C23C16/26 主分类号 B65D1/00
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