PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern formation method wherein degradation in dimensional accuracy of a pattern and the degrading in shape are suppressed. SOLUTION: The pattern formation method includes a step to form a first region 18 that has such a surface characteristic that a material for forming a pattern is deposited in priority and a second region 20 that has such a surface characteristic that a material for forming a pattern is harder to be deposited than the first region 18, and a step wherein the material for forming the pattern is supplied to a substrate 10 and the pattern is selectively formed in the first region 18. The material for forming the pattern is a solution containing metallic particles and it is supplied to the substrate 10 in liquid state. COPYRIGHT: (C)2004,JPO