发明名称 PHOTOMASK
摘要 <p><P>PROBLEM TO BE SOLVED: To form patterns of various sizes with a single chromeless mask. <P>SOLUTION: A plurality of grooves 2 are arranged parallelly on a mask substrate 1 so as to make areas where light intensity 3 drops come into contact with each other in one groove 2. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004109345(A) 申请公布日期 2004.04.08
申请号 JP20020270158 申请日期 2002.09.17
申请人 SEIKO EPSON CORP 发明人 KOKUBO AKIRA
分类号 G03F1/34;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/34
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