| 发明名称 |
Method for locally heating a region in a semiconductor substrate |
| 摘要 |
A method is proposed for locally heating a region that is disposed in a substrate. A substrate is provided and at least one region is produced in the substrate with a lower specific resistance than the surrounding substrate. The region is then locally heated by inducing eddy currents by irradiation with electromagnetic energy.
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| 申请公布号 |
US2004067661(A1) |
申请公布日期 |
2004.04.08 |
| 申请号 |
US20030612628 |
申请日期 |
2003.07.02 |
| 申请人 |
MANGER DIRK |
发明人 |
MANGER DIRK |
| 分类号 |
C23C16/04;H01L21/02;H01L21/285;H01L21/324;H01L21/326;H01L21/334;H01L21/8242;(IPC1-7):H01L21/66 |
主分类号 |
C23C16/04 |
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