Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process

摘要

Polymerizable silicon-containing compounds of formula (1) wherein R<1 >is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs.