发明名称 PATTERNED WAFER INSPECTION USING SPATIAL FILTERING
摘要 Apparatus for spatial filtering includes a Fourier lens, adapted to collect radiation emitted from a point and to separate the collected radiation into spatial components in a Fourier plane of the lens, and a programmable spatial filter, positioned at the Fourier plane. An image sensor is optically coupled to capture an image of the spatial components of the collected radiation in the Fourier plane, while the components are incident on the filter. A filter controller is coupled to receive and analyze the image captured by the image sensor and, responsive thereto, to control the spatial filter so as to block one or more of the spatial components.
申请公布号 WO03060489(A3) 申请公布日期 2004.04.08
申请号 WO2003US00769 申请日期 2003.01.09
申请人 APPLIED MATERIALS, INC. 发明人 SOME, DANIEL, I.
分类号 G01N21/95;G01N21/956 主分类号 G01N21/95
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