| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a vacuum treatment device capable of preventing a substrate carrier heated together with the substrate from having high temperature above a substrate preheating temperature. <P>SOLUTION: This vacuum treatment device uses substrate carriers 1A, 1B moving between a treatment chamber under a vacuum atmosphere and a loader chamber under atmospheric pressure and carrying the substrate. A loader chamber transferring the substrates to the substrate carriers 1A, 1B adjacent to a load chamber 10 under atmospheric pressure is equipped with a cooling device 90 for the substrate carriers 1A, 1B under a no-loading condition. <P>COPYRIGHT: (C)2004,JPO</p> |
