发明名称 EXPOSURE DEVICE AND METHOD FOR CORRECTING EXPOSING POSITION
摘要 PROBLEM TO BE SOLVED: To obtain an exposure device and a method for correcting an exposing position, in which visible unevenness is not hardly caused in a recorded image. SOLUTION: An arranging position of a plurality of light exit parts in a fiber array part 31 is determined so as to cancel a positional deviation that is based on distortion of a lens in the device and is a positional deviation to a subscanning direction from a target position of the exposing position in a surface to be exposed by a laser beam emitted from the fiber array part 31. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004109197(A) 申请公布日期 2004.04.08
申请号 JP20020268396 申请日期 2002.09.13
申请人 FUJI PHOTO FILM CO LTD 发明人 MIYAGAWA ICHIRO
分类号 B41J2/44;G02B26/10;H04N1/06;H04N1/23;(IPC1-7):G02B26/10 主分类号 B41J2/44
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