SUBSTRATE PROCESSING APPARATUS

摘要

A substrate processing apparatus stably and efficiently conducts a film-forming process on a substrate (W) to be processed. In the substrate processing apparatus, the substrate (W) to be processed is supported at a position facing a heater portion and a holding member for holding the substrate (W) is rotated, whereby the temperature distribution of the substrate (W) is kept uniform and a warp of the substrate (W) is suppressed. A shaft of the holding member penetrates through the heater portion and is inserted into a ceramic shaft of a rotational drive unit, and the ceramic shaft is supported by a ceramic bearing, thereby enabling to prevent contamination by a metal. The rotational driving force of a motor is transferred to the ceramic shaft via a magnet coupling.