发明名称 SUBSTRATE INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus for preventing the apparatus from growing in size while inspecting large-sized substrates. SOLUTION: The substrate inspection apparatus is provided with a holding member 104 which holds the substrate 100, an optical system 121 which forms an image of a portion of the surface to be inspected of the substrate 100, a moving means which relatively moves the optical system 121 in relation to the substrate 100 in a direction approximately parallel to the surface of the substrate 100 and rotates the substrate 100 by using the holding member 104 thereby moving an arbitrary portion of the substrate 100 into an imaging field of view of the optical system 121, and a rotating means which rotates the optical system 121 about an axis that is the approximate center of the imaging field of view of the optical system 121 in accordance with the rotation of the substrate 100. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004108957(A) 申请公布日期 2004.04.08
申请号 JP20020272466 申请日期 2002.09.19
申请人 NIKON CORP 发明人 FUKUI TATSUO
分类号 G01B11/24;G01N21/956;H01L21/027;H01L21/66;H01L21/68;(IPC1-7):G01N21/956 主分类号 G01B11/24
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