发明名称 Pressure-welded semiconductor device
摘要 In a pressure-welded semiconductor device where at least one semiconductor element is disposed inside a casing, a buffer conductive layer including conductive carbons is disposed at pressure-welded portions between first casing-side electrodes and element-side electrodes disposed on a first main surface and at pressure-welded portions between second casing-side electrodes and element-side electrodes disposed on a second main surface.
申请公布号 US2004066610(A1) 申请公布日期 2004.04.08
申请号 US20030659289 申请日期 2003.09.11
申请人 KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO 发明人 MIYACHI YUKIO;OKAMOTO ATSUTO
分类号 B82B1/00;H01L21/52;H01L21/60;H01L21/603;H01L23/373;H01L23/473;H01L23/48;H01L23/498;H01L29/739;H01L29/78;H02H3/00;(IPC1-7):H02H3/00 主分类号 B82B1/00
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