WAFER SUPPORTING ASSEMBLY OF CVD EQUIPMENT

摘要

PURPOSE: A wafer supporting assembly of CVD equipment is provided to prevent effectively troubles of a heating unit by interrupting the inflow of undesired gases into a heating unit. CONSTITUTION: A wafer supporting assembly of CVD equipment includes an assembly body(300), a heating unit(400), and a susceptor(200). The assembly body(300) is installed in the inside of a chamber for processing a CVD reaction. The heating unit(400) is located on an upper portion of the assembly body(300). The susceptor(200) is located on an upper portion of the heating unit(400) in order to support a wafer. The susceptor(200) includes an extended rim(250) to prevent the inflow of reaction gases into the heating unit.