SUBSTRATE TREATING DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To improve the treated qualities of substrates by suppressing the deformation of a boat when the boat is put in a treating chamber and preventing the occurrence of particles. SOLUTION: A substrate treating device having the treating chamber for treating the substrates, a supporting body 11 which supports the substrates in the treating chamber, and a heater which heats the substrates in the treating chamber is provided with a heat insulating section 25 in the upper part of the supporting body 11. COPYRIGHT: (C)2004,JPO