| 摘要 |
PROBLEM TO BE SOLVED: To plot a concentric or spiral pattern in an electron beam plotting device. SOLUTION: The electron beam plotting device is provided with a rotary stage unit 45 for rotatably supporting a circular board 11, a shaft 46 penetrated into a part of the unit 45 and extended in the one-radius direction (Y direction) of a circular stage 41, a straight movement means 49 for moving the unit 45 along the shaft 46, and a controller 50 for controlling the rotational speed of the stage 41 and the straight movement of the stage 41 by the means 49. The controller 50 is provided with a control circuit capable of selectively performing concentric pattern plotting or spiral pattern plotting. COPYRIGHT: (C)2004,JPO
|
