发明名称 ELECTRON BEAM DRAWING METHOD, ELECTRON BEAM DRAWING SYSTEM USED THEREFOR, METHOD OF PRODUCING MOLDING DIE USING THE SAME METHOD, DIE PRODUCED THEREBY AND OPTICAL ELEMENT MOLDED BY THE DIE
摘要 PROBLEM TO BE SOLVED: To produce a lens molding die capable of forming a diffraction structure for correcting aberration on an optical lens without causing the reduction in diffraction efficiency and the reduction in a product value, and further, to produce a molding die for an optical element such as an optical aberration correction element using drawing by an electron beam drawing system. SOLUTION: On drawing to a base material by applying an electron beam and scanning the same, the electron beam drawing method comprises a first step where the electron beam is scanned in a first dose, and drawing is carried out; a second step where the electron beam is scanned in a second dose, and drawing is carried out; and a third step where a region in which a part drawn in the first dose and a part drawn in the second dose coexist is provided. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004107793(A) 申请公布日期 2004.04.08
申请号 JP20030301140 申请日期 2003.08.26
申请人 KONICA MINOLTA HOLDINGS INC 发明人 MASUDA OSAMU;FURUTA KAZUMI
分类号 C25D1/00;C25D1/10;(IPC1-7):C25D1/00 主分类号 C25D1/00
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