发明名称 |
ELECTRON BEAM DRAWING METHOD, ELECTRON BEAM DRAWING SYSTEM USED THEREFOR, METHOD OF PRODUCING MOLDING DIE USING THE SAME METHOD, DIE PRODUCED THEREBY AND OPTICAL ELEMENT MOLDED BY THE DIE |
摘要 |
PROBLEM TO BE SOLVED: To produce a lens molding die capable of forming a diffraction structure for correcting aberration on an optical lens without causing the reduction in diffraction efficiency and the reduction in a product value, and further, to produce a molding die for an optical element such as an optical aberration correction element using drawing by an electron beam drawing system. SOLUTION: On drawing to a base material by applying an electron beam and scanning the same, the electron beam drawing method comprises a first step where the electron beam is scanned in a first dose, and drawing is carried out; a second step where the electron beam is scanned in a second dose, and drawing is carried out; and a third step where a region in which a part drawn in the first dose and a part drawn in the second dose coexist is provided. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004107793(A) |
申请公布日期 |
2004.04.08 |
申请号 |
JP20030301140 |
申请日期 |
2003.08.26 |
申请人 |
KONICA MINOLTA HOLDINGS INC |
发明人 |
MASUDA OSAMU;FURUTA KAZUMI |
分类号 |
C25D1/00;C25D1/10;(IPC1-7):C25D1/00 |
主分类号 |
C25D1/00 |
代理机构 |
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