发明名称 |
AN APPARATUS FOR THE DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS |
摘要 |
An integrated deposition system is described that is capable of vaporizing low vapor pressure liquid precursors and conveying the vapor to a processing region to fabricate advanced integrated circuits. The integrated deposition system includes a heated exhaust system, a remote plasma generator, a processing chamber, a liquid delivery system, and a computer control module that together create a commercially viable and production worthy system for depositing high capacity dielectric materials from low vapor pressure precursors. |
申请公布号 |
AU2003275163(A1) |
申请公布日期 |
2004.04.08 |
申请号 |
AU20030275163 |
申请日期 |
2003.09.19 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BOBBY, M. RONSSE;CRAIG, R. METZNER;RICHARD, OMAR COLLINS |
分类号 |
C23C16/40;C23C16/44;C23C16/448;C23C16/452;C23C16/455;C23C16/54;(IPC1-7):C23C16/54 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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