| 发明名称 |
Processing apparatus and cleaning method |
| 摘要 |
Provided is a parallel-plate-type processing apparatus (10), which performs plasma CVD and includes a chamber (11) to be cleaned. To perform cleaning of the chamber (11), plasma of a gas including fluorine is generated outside the chamber (11), and supplied into the chamber (11). During the cleaning, an RF power is applied to electrode plates (12, 17) inside the chamber (11).
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| 申请公布号 |
US2004065344(A1) |
申请公布日期 |
2004.04.08 |
| 申请号 |
US20030344042 |
申请日期 |
2003.11.07 |
| 申请人 |
OKA SHINSUKE;YOKOYAMA OSAMU;NAKASE RISA;ISHIZUKA SHUUICHI |
发明人 |
OKA SHINSUKE;YOKOYAMA OSAMU;NAKASE RISA;ISHIZUKA SHUUICHI |
| 分类号 |
B08B7/00;C23C16/44;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C25F5/00 |
主分类号 |
B08B7/00 |
| 代理机构 |
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