发明名称 Method and apparatus for performing rule-based gate shrink utilizing dipole illumination
摘要 A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gates features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination. <IMAGE>
申请公布号 EP1349003(A3) 申请公布日期 2004.04.07
申请号 EP20030251874 申请日期 2003.03.25
申请人 ASML MASKTOOLS B.V. 发明人 HSU, DUAN-FU STEPHEN;CORCORAN, NOEL;CHEN, JANG FUNG
分类号 G03F1/00;G03F1/36;G03F7/20;H01L21/027 主分类号 G03F1/00
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