发明名称 |
Method and apparatus for performing rule-based gate shrink utilizing dipole illumination |
摘要 |
A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gates features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination. <IMAGE> |
申请公布号 |
EP1349003(A3) |
申请公布日期 |
2004.04.07 |
申请号 |
EP20030251874 |
申请日期 |
2003.03.25 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
HSU, DUAN-FU STEPHEN;CORCORAN, NOEL;CHEN, JANG FUNG |
分类号 |
G03F1/00;G03F1/36;G03F7/20;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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