发明名称 Process to fabricate an integrated micro-fluidic system on a single wafer
摘要 Formation of micro-fluidic systems is normally achieved using a multi-wafer fabrication procedure. The present invention teaches how a complete micro-fluidic system can be implemented on a single chip. The invention uses only dry etch processes to form micro-chambers. In particular, it makes use of deep reactive ion etching whereby multiple trenches of differing depths may be formed simultaneously. Buried micro-chambers are formed by isotropically increasing trench widths using an etchant that does not attack the mask so the trenches grow wider beneath the surface until they merge. Deposition of a dielectric layer over the trenches allows some trenches to be sealed and some to be left open. Micro-pumps are formed by including in the micro-chamber roof a layer that is used to change chamber volume either through electrostatically induced motion or through thermal mismatch as a result of its being heated.
申请公布号 US6716661(B2) 申请公布日期 2004.04.06
申请号 US20020147006 申请日期 2002.05.16
申请人 INSTITUTE OF MICROELECTRONICS;NATIONAL UNIVERSITY OF SINGAPORE 发明人 ZOU QUANBO;CHEN YU;SINGH JANAK;LIM TIT MENG;YAN TIE;HENG CHEW KIAT
分类号 B81C99/00;F04B43/04;(IPC1-7):H01L21/00 主分类号 B81C99/00
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