发明名称 Functional device and method of manufacturing the same
摘要 A functional device free from cracking and having excellent functional characteristics, and a method of manufacturing the same are disclosed. A low-temperature softening layer (12) and a heat-resistant layer (13) are formed in this order on a substrate (11) made of an organic material such as polyethylene terephthalate, and a functional layer (14) made of polysilicon is formed thereon. The functional layer (14) is formed by crystallizing an amorphous silicon layer, which is a precursor layer, with laser beam irradiation. When a laser beam is applied, heat is transmitted to the substrate (11) and the substrate (11) tends to expand. However, a stress caused by a difference in a thermal expansion coefficient between the substrate (11) and the functional layer (14) is absorbed by the low-temperature softening layer (12), so that no cracks and peeling occurs in the functional layer (14). The low-temperature softening layer (12) is preferably made of a polymeric material containing an acrylic resin. By properly interposing a metal layer and a heat-resistant layer between the substrate (11) and the functional layer (14), a laser beam of higher intensity can be irradiated.
申请公布号 US6716664(B2) 申请公布日期 2004.04.06
申请号 US20030391811 申请日期 2003.03.20
申请人 SONY CORPORATION 发明人 MACHIDA AKIO;GOSAIN DHARAM PAL;USUI SETSUO
分类号 H01L21/00;H01L21/20;H01L21/31;H01L21/336;H01L21/77;H01L21/84;H01L27/01;H01L29/786;H01L29/94;H01L51/40;(IPC1-7):H01L51/40 主分类号 H01L21/00
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