发明名称 Schottky gate field effect transistor
摘要 A Schottky gate FET including a gate electrode having a gate extension, a drain electrode and a drain contact layer overlying a semi-insulating substrate, wherein the gate extension overlies at least part of the drain electrode and the drain contact layer. The vertical overlapping between the gate extension and the drain contact region prevents the current reduction to make the circuit module mounting the Schottky gate FET non-usable.
申请公布号 US6717192(B2) 申请公布日期 2004.04.06
申请号 US20030337107 申请日期 2003.01.06
申请人 NEC COMPOUND SEMICONDUCTOR DEVICES, LTD. 发明人 MIYOSHI YOSUKE
分类号 H01L21/338;H01L29/423;H01L29/812;(IPC1-7):H01L29/80 主分类号 H01L21/338
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