发明名称 |
Method and apparatus for radiation enhanced supercritical fluid processing |
摘要 |
A supercritical process vessel with an interior for holding a supercritical fluid is provided. A wafer support for supporting a wafer within the interior of a supercritical process vessel to expose the wafer to the supercritical fluid is provided. A lamp, which is able to operate at supercritical fluid pressures within the interior of the supercritical process vessel is provided.
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申请公布号 |
US6715498(B1) |
申请公布日期 |
2004.04.06 |
申请号 |
US20020236613 |
申请日期 |
2002.09.06 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
HUMAYUN RAASHINA;JOYCE PATRICK CHRISTOPHER;GAURI VISHAL;TIPTON ADRIANNE KAY |
分类号 |
B08B7/00;H01L21/00;(IPC1-7):B08B7/04 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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