| 摘要 |
A wafer W is placed on a lower electrode 108 provided inside a processing chamber 102 of a CVD apparatus 100 and is heated to achieve a temperature equal to or greater than 350° C. and lower than 450° C. SiH4 and SiF4 with both their flow rates set at 20 sccm, B2H6 with its flow rate set at 7 sccm, O2 with its flow rate set at 200 sccm and Ar with its flow rate set at 400 sccm are introduced into the processing chamber 102, and a pressure within the range of 0.01 Torr~10 Torr is set. 20 W/cm<2 >power at a frequency of 27.12 MHz and 10 W/cm<2 >power at a frequency of 400 kHz are respectively applied to an upper electrode 116 and the lower electrode 108 to generate plasma, and a layer insulating film 204 constituted of an SiOB film containing F is formed on the wafer W. With the B atoms incorporated into the molecular skeleton in the network structure of the SiOB film and the F atoms lowering the hygroscopicity by preventing formation of Si-OH bonds and the like, a dielectric constant of approximately 3.0 is achieved.
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