发明名称 MASK
摘要 The design consists of the features of shape and configuration of the MASK shown in the attached drawings, wherein:FIG.1 is an elevational view of the mask in accordance with the design;FIG.2 is a top plan view of the design shown in FIG.1;FIG.3 is a bottom plan view of the design shown in FIG.1;FIG.4 is a side view of the design shown in FIG.1; andFIG.5 is a perspective view of the design shown in FIG.1.
申请公布号 CA102832(S) 申请公布日期 2004.04.06
申请号 CA20030102832F 申请日期 2003.04.25
申请人 SHISEIDO CO., LTD. 发明人
分类号 主分类号
代理机构 代理人
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