ORGANIC THIN FILM, METHOD AND APPARATUS USING LARGE AREA ORGANIC VAPOR DEPOSITION FOR ORGANIC THIN FILM

摘要

PURPOSE: An organic thin film, its method and apparatus using large area organic vapor deposition for the organic thin film are provided to be capable of precisely controlling the thickness and composition of the organic thin film. CONSTITUTION: An organic vapor depositing apparatus is provided with a reaction chamber(100), a substrate support part installed at the inner portion of the chamber for supporting a substrate, a substrate temperature control part, and a depositing part installed opposite to the substrate support part for uniformly distributing organic source gas phase onto the substrate. At this time, the depositing part includes a shower head. The organic vapor depositing apparatus further includes a source chamber(300) for generating the organic source gas phase, a source heating part(500) for enclosing the source chamber, and a carrier gas supply source for flowing the organic source gas phase to the reaction chamber by supplying carrier gas.