发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD TO CONTROL ABSORPTION OF THE LIGHT |
摘要 |
PURPOSE: A substrate processing apparatus is provided to control absorption of the light from a light source through a light transmission window by including a driving unit for relatively transferring a substrate to be processed in a direction parallel to a surface to be processed with respect to the light transmission window. CONSTITUTION: A light source(1) is prepared. The light from the light source passes through a light transmission window(4a-4f). A reaction chamber(5) whose inside can be decompressed is prepared. A substrate(6) to be processed is installed in a decompressed reaction chamber, confronting the light transmission window. At least the surface(6A) to be processed of the substrate confronting the light transmission window is processed. The substrate processing apparatus includes a driving unit(34) for relatively transferring the substrate in a direction parallel to the processed surface with respect to the light transmission window. The width(Ww) of the light transmission window in the relative transfer direction of the substrate with respect to the light transmission window is smaller than the length(Wb) of the substrate in the transfer direction.
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申请公布号 |
KR20040028578(A) |
申请公布日期 |
2004.04.03 |
申请号 |
KR20030067353 |
申请日期 |
2003.09.29 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD. |
发明人 |
NAKATA YUKIHIKO;OKAMOTO TETSUYA;AZUMA KAZUFUMI;GOTO MASASHI |
分类号 |
H01L21/26;C23C16/458;C23C16/48;C30B25/10;H01L21/00;(IPC1-7):H01L21/26 |
主分类号 |
H01L21/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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