发明名称 GALLIUM-NITRIDE-BASED SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To obtain a gallium-nitride-based semiconductor light emitting element wherein it stands a high temperature when forming gallium nitride and can form a light emitting layer having a high degree of crystallinity. <P>SOLUTION: The gallium-nitride-based semiconductor light emitting element has a light emitting layer 400 made of a gallium-nitride-based compound semiconductor which is formed above a silicon substrate 100. Further, a silicon carbide heteroepitaxial layer 200 is formed between the silicon substrate 100 and the light emitting layer 400. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004104056(A) 申请公布日期 2004.04.02
申请号 JP20020303609 申请日期 2002.09.09
申请人 HOSIDEN CORP 发明人 OBAYASHI YOSHIAKI;MINE KEIJI
分类号 H01L21/205;H01L33/12;H01L33/32;H01L33/36 主分类号 H01L21/205
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