发明名称 |
GALLIUM-NITRIDE-BASED SEMICONDUCTOR LIGHT EMITTING ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a gallium-nitride-based semiconductor light emitting element wherein it stands a high temperature when forming gallium nitride and can form a light emitting layer having a high degree of crystallinity. <P>SOLUTION: The gallium-nitride-based semiconductor light emitting element has a light emitting layer 400 made of a gallium-nitride-based compound semiconductor which is formed above a silicon substrate 100. Further, a silicon carbide heteroepitaxial layer 200 is formed between the silicon substrate 100 and the light emitting layer 400. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004104056(A) |
申请公布日期 |
2004.04.02 |
申请号 |
JP20020303609 |
申请日期 |
2002.09.09 |
申请人 |
HOSIDEN CORP |
发明人 |
OBAYASHI YOSHIAKI;MINE KEIJI |
分类号 |
H01L21/205;H01L33/12;H01L33/32;H01L33/36 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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