| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for storing and conveying substrates, which prevents natural oxidation of a metal film on the surfaces of the substrates. SOLUTION: A semiconductor substrate having a metal film on the surface thereof is stored in a closed vessel, being immersed in extrapure water having a dissolved oxygen concentration of 300ppb or below. Since the dissolved oxygen concentration is considerably low, natural oxidation can be prevented. Alternatively, the semiconductor substrate can be stored in a vessel, being immersed in extrapure water or pure water blended with a reductant, or in active hydrogen water. With the presence of a reductant or active hydrogen, natural oxidation of the metal film can be prevented. COPYRIGHT: (C)2004,JPO |
