发明名称 THIN-FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a thin-film-forming apparatus which easily accesses inside a chamber when a substrate holder is charged and unloaded into and from the thin-film-forming apparatus, during the maintenance or the like. SOLUTION: The thin-film-forming apparatus A comprises several vacuum chambers (a feeding chamber C1, a film-forming chamber C2 and an unloading chamber C3). The vacuum chambers include an auxiliary chamber (the feeding chamber C1 and the unloading chamber C3) to and from which the substrate to be film-formed is charged and unloaded. The auxiliary chamber has a door 20 for opening/closing the auxiliary chamber 20. A mating face between the door 20 and a main body of the auxiliary chamber directs toward an approximately vertical direction and is slanted by a predetermined angle against the face connecting the auxiliary chamber with the film-forming chamber C2 which is connected to the auxiliary chamber. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004099948(A) 申请公布日期 2004.04.02
申请号 JP20020260976 申请日期 2002.09.06
申请人 SHINCRON:KK 发明人 AOYAMA TAKAAKI;YAMAGUCHI SHINJI;OZAWA KENJI;MURATA TAKANORI;EINAGA HIROKO;KOGA HIDENORI
分类号 C23C14/56;(IPC1-7):C23C14/56 主分类号 C23C14/56
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