HIGHLY ACID-RESISTANT MESOPOROUS SILICA THIN FILM, CLUSTER-INCLUDING THIN FILM USING THE SAME, AND THEIR FORMING PROCESSES

摘要

PROBLEM TO BE SOLVED: To provide a mesoporous silica thin film showing a sufficient acid resistance and excellent in surface smoothness and orientation of pores, a cluster-including thin film using the same, and their forming processes. SOLUTION: The mesoporous silica thin film has a thickness of≤1μm and a central pore diameter of 1-50 nm. In the X-ray diffraction measurement of the film, the initial intensity (I1) of a peak corresponding to plane (100) and the intensity (I2) of the peak obtained after performing an acid-resistance test by soaking the film in an acidic solution for 24 hr, satisfy the relation (1): (1-(I2/I1))×100≤90. COPYRIGHT: (C)2004,JPO