发明名称 CHARGED PARTICLE BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To carry out transfer exposure which improves the contrast of a whole body and which is high in linewidth precision. SOLUTION: An electronic lens 209 is constituted of an exciting coil 209b and a U-shape magnetic pole 209a surrounding the exciting coil 209b. One side of lower part of the magnetic pole 209a surrounding the exciting coil 209b is formed of a member 209e made of beryllium or a beryllium alloy. The lower surface (opposing surface) 209d of the member 209e is positioned immediately above the electronic beam irradiation surface of a wafer and is opposed to the same. Since a backscattered electron scattering coefficient of beryllium is smaller compared with that of soft iron or the like, the re-reflecting rate of the electron reflected from the charged beam irradiation surface of the wafer to the opposing surface becomes low, thereby preventing fogging exposure due to a fogging effect. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004103826(A) 申请公布日期 2004.04.02
申请号 JP20020263634 申请日期 2002.09.10
申请人 NIKON CORP 发明人 KAWADA SHINTARO
分类号 G03F7/20;H01J37/141;H01J37/244;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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