| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner which can perform excellent exposure of high resolution by correcting double rotation symmetrical aberrations of a projection optical system following it simple mechanism. SOLUTION: This aligner is equipped with illumination systems 1 to 15 which illuminates a mask 16, and a projection optical system 18 which projects an image of the pattern of the mask on a substrate 19. Further, the device is equipped with a changing means 4 of changing the polarized state of light illuminating the mask while arranged in the optical system of the lighting systems, and an optical member 18a which is arranged in the optical path of the projection optical system and has a retardation distribution rotationally symmetrical about the optical axis. The optical member is arranged nearby an aperture stop AS or the mask. COPYRIGHT: (C)2004,JPO
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