HIGH CRYSTALLINE MESOPOROUS SILICA THIN FILM, ITS MANUFACTURING METHOD, CLUSTER CLATHRATE THIN FILM USING THE MESOPOROUS SILICA THIN FILM, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a mesoporous silica thin film having sufficient crystallinity, excellent smoothness of the pore surfaces and orientation of the pores, and to provide a method for manufacturing the mesoporous silica thin film, a cluster clathrate thin film by using the mesoporous silica thin film and its manufacturing method. SOLUTION: The high crystalline mesoporous silica thin film has≤1μm film thickness and 1 to 50 nm center pore diameter. In the X-ray diffraction measurement of the mesoporous silica thin film, the peak indicating the (100) plane shows≥50,000 cps intensity and≤0.21°of half bandwidth. The mesoporous silica thin film is used for the cluster clathrate thin film and its manufacturing method is provided. COPYRIGHT: (C)2004,JPO