发明名称 POLYMER COMPOUND
摘要 <P>PROBLEM TO BE SOLVED: To provide a new polymer compound capable of generating with high sensitivity a radical by exposure of it to light or heat, causing a hardening reaction rapidly and proceeding the reaction. <P>SOLUTION: This polymer compound is characterized in that the compound has a structure represented by formula (I) : COCOO<SP>-</SP>M<SP>+</SP>(wherein M<SP>+</SP>represents an onium cation selected from sulfonium, iodonium, diazonium and azinium) in a side chain. Preferably, the polymer compound with such a side chain structure has a structure unit represented by formula (II) (wherein X represents a halogen atom or a monovalent organic group, Y represents a divalent organic linkage group, n is 0 or 1, and M<SP>+</SP>has the same meaning as the formula (I)). <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004099797(A) 申请公布日期 2004.04.02
申请号 JP20020265466 申请日期 2002.09.11
申请人 FUJI PHOTO FILM CO LTD 发明人 SHIMADA KAZUTO
分类号 G03F7/029;C08F8/00 主分类号 G03F7/029
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