发明名称 NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive resin composition which can form a rectangular pattern with high resolution and has superior sensitivity, developing property, size faithfulness, etc. <P>SOLUTION: This negative radiation-sensitive resin composition contains (1) an alkali-soluble resin consisting of a resin (A) or (B), (2) a radiation-sensitive acid producing agent, (3) a bridging agent selected between an alkoxy methylated glycol uryl compound and an alkoxy methylated melamine compound, and (4) a basic compound. Here, the resin (A) is of 100 to 50 mol % in content of hydroxy styrene units, 5,000 to 100, 000 in polystyrene-converted weight mean molecular weight, and &le;1.3 in dispersion degree. Further, the resin (B) has hydroxy styrene units and (met)acrylate ester units. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004102309(A) 申请公布日期 2004.04.02
申请号 JP20030386917 申请日期 2003.11.17
申请人 JSR CORP 发明人 IKEZAKI HIROTSUGU;YAMACHIKA MIKIO;OTA TOSHIYUKI;TSUJI AKIRA
分类号 G03F7/038;C08F12/14;C08F220/12;G03F7/004;H01L21/027 主分类号 G03F7/038
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