PLASMA MONITORING METHOD, PLASMA MONITORING DEVICE AND PLASMA TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a plasma monitoring device which can stably measure with high precision by guaranteeing reproducibility of a measuring position, improving the stability and durability of a probe structure, stabilizing the effect on a plasma, and by improving the S/N characteristics.

SOLUTION: The plasma monitoring device is provided with an insulating tube 50 bridged over a chamber 10 across a plasma treatment space, a coaxial cable 52 equipped with a probe with a core wire at the tip exposed and sliding movement freely inserted into the tube from one end of the insulating tube 50, and a measurement circuit 54 for measuring an electromagnetic wave frequency absorbed by electrons in a plasma PZ in the chamber 10 through the coaxial cable 50.

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