APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To eliminate a deviation of a central position of a wafer at a central position of a plasma distribution, generated without replacing an upper electrode even when an interval between opposed electrodes of a plasma device is changed. SOLUTION: An apparatus for manufacturing a semiconductor device includes a plasma reaction chamber 11, the upper electrode 13 provided at an upper part of the chamber 11, a lower electrode 15 provided oppositely to the electrode 13 in the chamber 11 to hold the wafer 30 on its main surface, and a support member 23 for regulating an interval between the electrode 13 and the electrode 15. A plurality of holes 13a for passing gas to be introduced into the chamber 11 from an exterior are provided at the electrode 13. A hole blocking implement 24 for selectively opening or closing the plurality of the holes 13a provided at the upper electrode is provided in the chamber 11. COPYRIGHT: (C)2004,JPO