| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask which has a beam transmission part formed without being limited to the spot diameter of a drawing beam and its manufacturing method. <P>SOLUTION: Two kinds of 1st and 2nd mask layers 1 and 2 which have a large etching selection ratio are laminated and cut along the laminating direction to form a mask substrate and the 1st mask layer 1 is selectively etched by using a resist pattern as an etching mask to form a mask having a mask opening (beam transmission part) C determined by the film thickness d1 of the 1st mask layer 1. Here, the film thickness of a laminated film is reducible almost to an atom layer in principle at present, so a mask having a mask opening C whose width is smaller than the minimum spot diameter of the drawing beam such as an electron beam can be formed. <P>COPYRIGHT: (C)2004,JPO</p> |
